Inox to invest in India for semiconductor industry
Industrial gases producer Inox Air Products has announced a major investment initiative to support the country’s fast-growing semiconductor and OSAT (Outsourced Semiconductor Assembly and Test) sectors. The company has already acquired a land parcel in Dholera, Gujarat earlier this year, for construction of an electronic specialty gas hub which is currently in advanced stage of planning.
The upcoming hub will manufacture and supply ultra high purity (UHP) bulk and specialty gases, including nitrogen, oxygen, argon, hydrogen that are essential for advanced semiconductor fabrication.
This investment forms part of Inox’s 500 crores rupees outlay to expanding purification capacities, building import-linked supply chains for critical gases, and deploying advanced transport and packaging solutions.
Speaking on the plans, Siddharth Jain, Managing Director – Inox Air Products said “With the hub, we are building the foundation for a self-reliant supply chain that can power the ambitions of global chipmakers and electronic manufacturers choosing India for setting up fabs. With a pan-India footprint, and decades of operational excellence, we are deploying the full breadth of our engineering and execution capabilities for creating a world-class infrastructure. This initiative is deeply aligned with the vision of Make in India and Atmanirbhar Bharat, enabling India to compete at a global scale.”
Inox is already supporting the operational needs of India’s first semiconductor investment in Gujarat, underscoring its readiness to serve advanced fabrication facilities with ultra-high purity gases and contamination-free delivery systems.
It also operates six large air separation units (ASUs) in Gujarat for manufacturing liquid oxygen, liquid nitrogen and liquid argon, servicing the industrial gas needs of multiple manufacturing sectors including semiconductors and solar cells.
Specialty and bulk gases play a vital role in semiconductor fabrication, enabling precision in etching, deposition, doping, and chamber cleaning. Their ultra-high purity is essential to wafer integrity, device performance, and fabrication yield.
